| Manufacturer | Tepla |
|---|---|
| Model | 600-AL |
| Year | |
| Location | USA
|
The Tepla 600-AL is a semi-automatic RF plasma system designed for semiconductor processing applications. It is capable of handling wafers up to 200 mm in diameter, making it suitable for photoresist stripping, surface cleaning, and etching of silicon and its compounds. The system features a ceramic chamber with a diameter of 245 mm and a depth of 380 mm, providing a controlled environment for plasma processing.
This model is equipped with an ENI RF generator delivering up to 600 watts at a frequency of 13.56 MHz. It includes four gas channels, each regulated by individual mass flow controllers (MFCs), allowing precise control of process gases. The vacuum system is supported by a Leybold D65B vacuum pump.
The machine's external dimensions are 740 mm in length, 624 mm in width, and 701 mm in height, excluding connections. It operates on a 230V electrical supply with a power consumption of 2 kW and a current of 15A at 50/60 Hz.
The control panel is equipped with a screen and multiple buttons, including an emergency stop button, facilitating user interaction and safety. A circular window is located on the left side of the upper panel, and the lower section features two compartments, one of which is open and reveals internal components such as wiring and cables. The back panel contains multiple ports and connectors, including coaxial and serial connectors, as well as two large circular ventilation ducts on the upper section.
The machine appears clean and well-maintained, with no visible damage or wear on the external panels. This Tepla 600-AL system offers a comprehensive setup for semiconductor plasma processing with user-friendly controls and accessible internal components.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
Model: 600 SemiAuto
- Semi-Automatic RF Plasma System
- Can process up to 200mm wafers
- Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds
- Chamber Size: 245mm diameter, 380mm depth
- Chamber Material: ceramic
- ENI RF Generator: 0-600 Watt, 13.56 MHz
- Gases: 4 channels controlled by 4 MFCs
- Leybold D65B Vacuum Pump
- Dimensions: 740mm x 624mm x 701mm + connections
- Electrical: 230V, 50/60Hz, 15A, 2kW
- 1731 hours
Please note that this description may have been translated or optimized with artificial intelligence (AI) automatically. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase.
| Client type | Machinery dealer |
| Active since | 2019 |
| Offers online | 57 |
| Last activity | Nov. 3, 2026 |
Model: 600 SemiAuto
- Semi-Automatic RF Plasma System
- Can process up to 200mm wafers
- Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds
- Chamber Size: 245mm diameter, 380mm depth
- Chamber Material: ceramic
- ENI RF Generator: 0-600 Watt, 13.56 MHz
- Gases: 4 channels controlled by 4 MFCs
- Leybold D65B Vacuum Pump
- Dimensions: 740mm x 624mm x 701mm + connections
- Electrical: 230V, 50/60Hz, 15A, 2kW
- 1731 hours
Please note that this description may have been translated or optimized with artificial intelligence (AI) automatically. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase.
The Tepla 600-AL is a semi-automatic RF plasma system designed for semiconductor processing applications. It is capable of handling wafers up to 200 mm in diameter, making it suitable for photoresist stripping, surface cleaning, and etching of silicon and its compounds. The system features a ceramic chamber with a diameter of 245 mm and a depth of 380 mm, providing a controlled environment for plasma processing.
This model is equipped with an ENI RF generator delivering up to 600 watts at a frequency of 13.56 MHz. It includes four gas channels, each regulated by individual mass flow controllers (MFCs), allowing precise control of process gases. The vacuum system is supported by a Leybold D65B vacuum pump.
The machine's external dimensions are 740 mm in length, 624 mm in width, and 701 mm in height, excluding connections. It operates on a 230V electrical supply with a power consumption of 2 kW and a current of 15A at 50/60 Hz.
The control panel is equipped with a screen and multiple buttons, including an emergency stop button, facilitating user interaction and safety. A circular window is located on the left side of the upper panel, and the lower section features two compartments, one of which is open and reveals internal components such as wiring and cables. The back panel contains multiple ports and connectors, including coaxial and serial connectors, as well as two large circular ventilation ducts on the upper section.
The machine appears clean and well-maintained, with no visible damage or wear on the external panels. This Tepla 600-AL system offers a comprehensive setup for semiconductor plasma processing with user-friendly controls and accessible internal components.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
| Client type | Machinery dealer |
| Active since | 2019 |
| Offers online | 57 |
| Last activity | Nov. 3, 2026 |
Машина за рязане - плазма / газ Tepla 600-AL
Řezačka plasmová / plynová Tepla 600-AL
Tepla 600-AL Skæremaskine - Plasma/gas
Tepla 600-AL Schneidemaschine - Plasma / gas
Κοπτική μηχανή - Plasma / gas Tepla 600-AL
Tepla 600-AL Plasma Asher
Máquina de corte por plasma / gas Tepla 600-AL
Machine de découpe plasma / gaz Tepla 600-AL
Stroj za rezanje - plazma / plin Tepla 600-AL
Tepla 600-AL Vágógép - Plazma/gáz
Impianto taglio plasma/ossitaglio Tepla 600-AL
Pjovimo mašina - Plazminė/dujinė Tepla 600-AL
Tepla 600-AL Snijmachine - Plasma/gas
Wycinarka plazmowa / gazowa Tepla 600-AL
Máquina de corte - Plasma / gás Tepla 600-AL
Mașină de tăiat - Plasmă/gaz Tepla 600-AL
Tepla 600-AL Станок для резки плазма / газ
Mašina za sečenje - plazma / gas Tepla 600-AL
Tepla 600-AL Skärmaskin - Plasma / gas
Kesim makinesi Tepla 600-AL
EN
- Languages
English (GB)