| Manufacturer | MRL |
|---|---|
| Model | Bandit 218 |
| Year | |
| Location | USA
|
| Category | Semiconductors - miscellaneous |
| worked hours | |
| hours under power | |
| state | good |
| At local norms | --------- |
| status | visible |
| Last availability date | 10/03/2026 |
| Product id | P240314058 |
| Language |
Пещ MRL Bandit 218
Pec MRL Bandit 218
MRL Bandit 218 ovn
MRL Bandit 218-Ofen
Φούρνος MRL Bandit 218
MRL Bandit 218 Furnace
Horno MRL Bandit 218
Fourneau MRL Bandit 218
MRL Bandit 218 Peć
MRL Bandit 218 kemence
Forno MRL Bandit 218
MRL Bandit 218 krosnis
MRL Bandit 218 Oven
Piec MRL Bandit 218
Forno MRL Bandit 218
MRL Bandit 218 Cuptor
Топка MRL Bandit 218
MRL Bandit 218 Peć
MRL Bandit 218-ugn
MRL Bandit 218 Fırın
|
This listing is for an MRL Bandit 218 semiconductor processing furnace, designed for advanced LPCVD (Low Pressure Chemical Vapor Deposition) applications. The furnace features two LPCVD tubes: one configured for TEOS (tetraethyl orthosilicate) and annealing processes, and the other for nitride and poly deposition, supporting versatile semiconductor fabrication needs. The furnace tube diameter measures 200 mm.
The equipment includes comprehensive gas connections to support various process gases, including Air Low N2, Nitrogen (N2), FG1, Argon (Ar), Oxygen (O2), SiH2Cl2 (DCS), SiH4, and NH3. This range of gas inputs allows for flexible process recipes and doping techniques. Vacuum integrity is maintained by two Kashiyama vacuum pumps equipped with blowers, ensuring reliable vacuum conditions during processing.
Control is managed via two front-mounted control panels featuring buttons and displays, facilitating user interaction and process adjustments. A Schumacher M-Dot dopant source controller is integrated, providing precise dopant delivery control. The furnace and gas module dimensions are 66 x 36 x 78 inches and 18 x 36 x 78 inches respectively, indicating a substantial footprint suitable for industrial semiconductor manufacturing environments.
Power requirements for the unit are 480V with a maximum current of 250 Amps. The equipment appears clean and well-maintained with no visible damage, reflecting good overall condition. Additional visible components include orange robotic arms mounted on the right side of the equipment, likely used for handling or processing tasks, and a computer workstation with a CRT monitor and keyboard positioned nearby for operational control and monitoring.
This MRL Bandit 218 furnace is a robust solution for semiconductor processing facilities seeking reliable LPCVD capabilities with integrated control and automation features.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
Offer Title: MRL Bandit 218 Furnace
Manufacturer: MRL
Model: Bandit 218
Technical Condition: Good
State: Visible
Furnace Tube Diameter: 200mm
LPCVD Furnace Tube 1: TEOS/Anneal
LPCVD Furnace Tube 2: Nitride/Poly
Gas Connections:
- Air Low N2
- N2
- FG1
- Ar
- O2
- SiH2Cl2 (DCS)
- SiH4
- NH3
Vacuum Pumps: 2 Kashiyama vacuum pumps with blowers
Dopant Source Controller: Schumacher M-Dot
Furnace Dimensions: 66 x 36 x 78 inches
Gas Module Dimensions: 18 x 36 x 78 inches
Power Requirements: 480V, 250 Amps Max
Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase
| Client type | Machinery dealer |
| Active since | 2019 |
| Offers online | 58 |
| Last activity | June 6, 2026 |
Offer Title: MRL Bandit 218 Furnace
Manufacturer: MRL
Model: Bandit 218
Technical Condition: Good
State: Visible
Furnace Tube Diameter: 200mm
LPCVD Furnace Tube 1: TEOS/Anneal
LPCVD Furnace Tube 2: Nitride/Poly
Gas Connections:
- Air Low N2
- N2
- FG1
- Ar
- O2
- SiH2Cl2 (DCS)
- SiH4
- NH3
Vacuum Pumps: 2 Kashiyama vacuum pumps with blowers
Dopant Source Controller: Schumacher M-Dot
Furnace Dimensions: 66 x 36 x 78 inches
Gas Module Dimensions: 18 x 36 x 78 inches
Power Requirements: 480V, 250 Amps Max
Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase
| Category | Semiconductors - miscellaneous |
| worked hours | |
| hours under power | |
| state | good |
| At local norms | --------- |
| status | visible |
| Last availability date | 10/03/2026 |
| Product id | P240314058 |
| Language |
Пещ MRL Bandit 218
Pec MRL Bandit 218
MRL Bandit 218 ovn
MRL Bandit 218-Ofen
Φούρνος MRL Bandit 218
MRL Bandit 218 Furnace
Horno MRL Bandit 218
Fourneau MRL Bandit 218
MRL Bandit 218 Peć
MRL Bandit 218 kemence
Forno MRL Bandit 218
MRL Bandit 218 krosnis
MRL Bandit 218 Oven
Piec MRL Bandit 218
Forno MRL Bandit 218
MRL Bandit 218 Cuptor
Топка MRL Bandit 218
MRL Bandit 218 Peć
MRL Bandit 218-ugn
MRL Bandit 218 Fırın
|
This listing is for an MRL Bandit 218 semiconductor processing furnace, designed for advanced LPCVD (Low Pressure Chemical Vapor Deposition) applications. The furnace features two LPCVD tubes: one configured for TEOS (tetraethyl orthosilicate) and annealing processes, and the other for nitride and poly deposition, supporting versatile semiconductor fabrication needs. The furnace tube diameter measures 200 mm.
The equipment includes comprehensive gas connections to support various process gases, including Air Low N2, Nitrogen (N2), FG1, Argon (Ar), Oxygen (O2), SiH2Cl2 (DCS), SiH4, and NH3. This range of gas inputs allows for flexible process recipes and doping techniques. Vacuum integrity is maintained by two Kashiyama vacuum pumps equipped with blowers, ensuring reliable vacuum conditions during processing.
Control is managed via two front-mounted control panels featuring buttons and displays, facilitating user interaction and process adjustments. A Schumacher M-Dot dopant source controller is integrated, providing precise dopant delivery control. The furnace and gas module dimensions are 66 x 36 x 78 inches and 18 x 36 x 78 inches respectively, indicating a substantial footprint suitable for industrial semiconductor manufacturing environments.
Power requirements for the unit are 480V with a maximum current of 250 Amps. The equipment appears clean and well-maintained with no visible damage, reflecting good overall condition. Additional visible components include orange robotic arms mounted on the right side of the equipment, likely used for handling or processing tasks, and a computer workstation with a CRT monitor and keyboard positioned nearby for operational control and monitoring.
This MRL Bandit 218 furnace is a robust solution for semiconductor processing facilities seeking reliable LPCVD capabilities with integrated control and automation features.
The following description has been generated using artificial intelligence based on the product information available. It is provided for guidance only and may not reflect all specifications or conditions. Please contact us if you need precise or confirmed details.
| Client type | Machinery dealer |
| Active since | 2019 |
| Offers online | 58 |
| Last activity | June 6, 2026 |
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