Hitachi Kokusai Electric VR-120S
Wafer size 12
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The Hitachi Kokusai Electric VR-120S Wafer Machine, introduced in 2000, is a highly advanced and specialized pharmaceutical machine designed for thin-film deposition processes in semiconductor manufacturing. Developed by Hitachi Kokusai Electric Inc., this wafer machine plays a critical role in the production of integrated circuits and other semiconductor devices.
The VR-120S utilizes state-of-the-art Physical Vapor Deposition (PVD) technology to deposit thin films of various materials onto semiconductor wafers. Its vacuum chamber ensures a controlled and contamination-free environment for precise film deposition, enhancing the quality and reliability of semiconductor components.
With its multi-target capability, the VR-120S enables the deposition of different materials sequentially, supporting complex layer structures and advanced semiconductor fabrication techniques.
The wafer machine's advanced process control and monitoring systems ensure accurate film thickness control and uniformity across the entire wafer surface, critical for achieving consistent device performance and yields.
Despite being introduced in 2000, the Hitachi Kokusai Electric VR-120S Wafer Machine remains a relevant and reliable tool in semiconductor manufacturing due to its robust design and upgradable features. Its contribution to semiconductor technology and device miniaturization has been instrumental in driving technological advancements across various industries, including pharmaceuticals, electronics, and communications.
In conclusion, the Hitachi Kokusai Electric VR-120S Wafer Machine from 2000 exemplifies precision and innovation in semiconductor manufacturing. Its advanced PVD technology and process control capabilities make it an essential tool for fabricating high-performance semiconductor devices, influencing technological progress in the pharmaceutical and electronics sectors and beyond.
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