Showing 1 - 20 out of 47
Year: 2011
Thinning machine for silicon wafers up to 12 inches and other semiconductor materials Documentation 200 mm and 100 mm platens. Grinding wheels available.Year: 2010
Wafer Size 300 mm Process PE-ALD System Software Version Eagle I ASMJ software (Windows embedded XP / OS) See the configuration file below to download along with other documents. Full set of schematics available on request. Process PE-ALD Oxide, HT-SiO/HT-SiN Hardware Configuration (fab): Main System ASM PE-ALD System Mainframe 1 Handler System FI: Kawasaki / Vac: JEL 1 Factory Interface …Year: 2002
TB-Ploner tbp QBL-150 Quartz Boat Loader It is in excellent condition. It came directly from the clean room of a well known research institute in Europe. The Quartz Boat Loader is used to load a whole batch of 150mm wafers from a plastic cassette to a quartz cassette which is more environmentally suitable for the high temperatures of a furnace. …Year: 1998
Ultratech 2244i Stepper Wafer Size : 2 inch to 8 inch Resolution : 0.75um standard Field Size: 44mm x 22mm Professionally deinstalled in 2018, moved to a clean room for testing, now in storage Year 1998Year: 2005
Brooks Automation Fixload 6M Load Port Just removed from a machine which was in working condition before de-installation WAFER SIZE 300mmYear:
Refurbished Asyst Versaport 2200 Indexer It can be used for both mask cassettes and wafer cassettes. There are 2 EPROM chips with this indexer. 1st EPROM has the firmware for mask cassettes (Installed currently) 2nd EPROM has the firmware for wafer cassettes (in spare) Config: 8” Cassette Bolt Back Plate RFID Smart Tag support The user just needs to adjust …Year:
Rudolph Technologies NSX® wafer inspection systems offer high throughput along with repeatable macro wafer defect inspection for defects 0.5 micron and larger. Macro wafer defects can occur at various phases of semiconductor manufacturing, and can have a major impact on the quality of your microelectronic devices. This cost-effective used Rudolph Technologies NSX 105 wafer inspection system quickly and accurately detects …Year:
KARL SUSS MASK ALIGNER MA56 Description: The Karl Suss MA 56 is a mask alignment and exposure system that has highly ecnomonical production capabilities for wafers up to 125mm. It's easy to maintain and can be easily adapted to fit your particular process requirements.Year:
SSEC Evergreen Series II Photoresist Wafer Etcher Condition: Used Brand: SSEC Model: Evergreen Series II Includes: (1) Used SSEC Evergreen Series II Photoresist Wafer Etcher Chemical Storage Wafer Transfer Cabinet Transfer Cabinet Stainless Steel Recirculating Chillers X 2 Pump/Cooler Model # LG.HPC Solid State Equipment (SSEC) Evergreen Series II Model 203 Photoresist Wafer Etcher guaranteed whole and complete system. Set …Year: 2005
Lasertec M-350H Wafer Inspection/Review system 300mm Vintage:2005 As isYear: 2009
300mm Wet Spin Scrubber Vintage:2009 As isYear: 2002
The tool is fully operational, running Cu on both sides. The auxiliary equipment is a power cabinet and two chillers (one for each side). Chemical dispense systems support the whole fleet so no chemical dispense equipment would be included. We run off of slurry loops under the floor as well as direct chemical distribution from a VMB for the cleaner …Year:
- Manufacture: ASML - Model: AT1100B Twinscan - Manufacturing year: 2002 - Condition: WorkingYear:
Karl Suss/CASCADE MICROTECH PA-200HS Semiautomatic Probe System with Complete Accessories (Optional Upgrade for Temperature Measurement Available) Cascade Microtech/Prober/Karl Suss K&S PA200HS Include 4 unit of XYZ Prober Cascade Micro Positioner, Probe Arm and Prober Holder and Isolation Table DESCRIPTION The SUSS PA200 Semiautomatic Probe System is very stable, modular and flexible probe systems for wafers and substrates up to 200 …Year:
Equipment : Microscope - Leica High Power Set Location : In Factory Application : Visual Inspection(CD, OD, Pitch...) ▲ Eye pieces : X10 ▲ Lense : X2.5, X5, X10, X50, X100 ▲ No-Mask Prism Ass'y (편광/검광자 렌즈 키트) ▲ Working Size : 150 x 150 mm ▲ Measuring Stage(X,Y) : Min 0.1 Micron ~ ▲ Condition : Working condition ▲ …Year:
Equipment : High Power Microscope Location : In Factory Application : 10 inch X-Y Stage - Eye pieces : X10 - 2EA - Objective : X2.5, X10, X20, X50, X100, X150 - Polarization System - Illuminating(Bright/AD/FD), Objective Driving - Stage Moving/Measureing Unit(X/Y Driving Control)Year:
EBARA UFP 200 / 300M Photoresist Equipment is a state-of-the-art lithography system used to create intricate patterns and features on substrates. This unit is ideal for use in the production of high-tech integrated circuits, semiconductor devices, and other components used in the fabrication of microelectronic circuitry. It features a modular design to accommodate various production requirements. The machine is capable …Year:
Karl Suss PA-200 SemiAutomatic Probe System with Karl Suss PH250HF Probe XYZ Head and Arm & Other Accessories Karl Suss PA 200 with anti-vibration table including 3 units of Karl Suss Manual High Frequency Probe Head (PH250HF) with probe arm and probe head plus 1 unit spare XYZ Edmund Optic Micro Positioners. DESCRIPTION The SUSS PA200 Semiautomatic Probe System is …Year:
High stability bridge mount for optics Pneumatic microscope lift Motic PSM-1000 microscope with 2x/5x/10x/20x objectives Motic Fiber optic illuminator 150mm thermal vacuum chuck -65 to 200C temperature range Triaxial chuck and cables allow very low leakage measurements Temptronic TPO-3000A-2300-1 temperature controller and chiller microchamber with top hat assembly for dark probing Kinetic Systems vibration isolation table Optional: Probe card holder …Year:
150mm wafer chuck Windows XP OS 4 micropositioners (N,S,E,W) with camera and illuminator Olympus stereozoom with LED light